Engineering high-Q superconducting tantalum microwave coplanar waveguide resonators for compact coherent quantum circuits
Shima Poorgholam-Khanjari, Valentino Seferai, Paniz Foshat, Calum, Rose, Hua Feng, Robert H. Hadfield, Martin Weides, and Kaveh Delfanazari

TL;DR
This paper demonstrates the fabrication of high-Q superconducting tantalum microwave resonators with engineered thickness-dependent properties, enabling compact, high-fidelity quantum circuits with enhanced coupling capabilities.
Contribution
It introduces a method to produce high-quality, high-kinetic-inductance tantalum resonators on silicon substrates, optimizing their performance for quantum computing applications.
Findings
Maximum internal quality factor Q_i of ~3.6 million at high power for 100 nm Ta
Achieved kinetic inductance of 0.6 pH/sq for 40 nm thick Ta films
Successful fabrication without substrate heating using Nb seed layer
Abstract
Tantalum (Ta) has recently received considerable attention in manufacturing robust superconducting quantum circuits. Ta offers low microwave loss, high kinetic inductance compared to aluminium (Al) and niobium (Nb), and good compatibility with complementary metal-oxide-semiconductor (CMOS) technology, which is essential for quantum computing applications. Here, we demonstrate the fabrication engineering of thickness-dependent high quality factor (high-Q_i) Ta superconducting microwave coplanar waveguide resonators. All films are deposited on high-resistivity silicon substrates at room temperature without additional substrate heating. Before Ta deposition, a niobium (Nb) seed layer is used to ensure a body-centred cubic lattice ({\alpha}-Ta) formation. We further engineer the kinetic inductance (L_K) resonators by varying Ta film thicknesses. High L_K is a key advantage for applications…
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Taxonomy
TopicsSemiconductor Lasers and Optical Devices · Advanced Frequency and Time Standards · Photonic and Optical Devices
