Thin films as practical quantum materials: a status quo and beyond

TL;DR

This paper reviews the current state and future prospects of synthesizing quantum materials as thin films, emphasizing their importance for device integration and discussing key deposition techniques and challenges.

Contribution

It provides a comprehensive overview of thin film quantum material synthesis, highlighting recent progress, challenges, and future directions in the field.

Findings

Thin films enable integration of quantum materials into devices.

Molecular beam epitaxy and chemical vapor deposition are key techniques.

Progress suggests potential for practical quantum devices.

Abstract

Quantum materials have been in the limelight for several years now. These materials exhibit intriguing quantum phenomena, which when harnessed properly, promise extraordinary advancements across various scientific and technological domains. To fully exploit their potential, it is imperative to synthesize such quantum materials in thin film form so that they are compatible with well-established device fabrication techniques. In this perspective, an overview of the current status and future directions of thin film quantum material synthesis is provided. The criteria for quantum materials are discussed, as well as the many benefits of preparing them as thin films. Prominent deposition techniques such as molecular beam epitaxy and chemical vapor deposition are reviewed along with potential contenders. Despite challenges, progress in thin film quantum material technology holds the potential to realize practical devices with unprecedented functionalities.