Non-perturbative cathodoluminescence microscopy of beam-sensitive materials

TL;DR

This paper introduces a non-perturbative cathodoluminescence microscopy method using pan-sharpening techniques to enable high-resolution spectral imaging of beam-sensitive nanomaterials with minimal damage.

Contribution

It presents a novel application of pan-sharpening to cathodoluminescence microscopy, reducing beam damage while maintaining high spatial resolution.

Findings

Successful demonstration of minimally-perturbative spectral imaging

Enhanced spatial resolution in beam-sensitive materials

Potential for improved quantum photonic system analysis

Abstract

Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.