Modeling of pattern formation of the ordered intermediate phases during co-deposition of binary thin film

TL;DR

This paper models the formation of intermediate phase patterns in binary thin film co-deposition using stochastic and Monte Carlo simulations, identifying key morphologies and a topological parameter to distinguish them.

Contribution

It introduces a simulation approach combining Stochastic Kinetic Mean-Field and Monte Carlo methods to analyze pattern formation in thin-film co-deposition.

Findings

Identified three basic morphologies: spots, layered structures, and net-like patterns.

Characterized morphologies using a unique topological parameter.

Provided a framework for distinguishing phase patterns in thin films.

Abstract

Formation of the intermediate phase patterns in the thin-film co-deposition process is simulated using the Stochastic Kinetic Mean-Field method and Monte Carlo. Three basic morphologies of the 2D sections are distinguished: (1) spots (rod-like in 3D), (2) layered structures-lamellae, zigzags, and labyrinths (plate-like in 3D), and (3) net-like structures (inverse to spot-like structures, when spots become majority and the surrounding matrix becomes a minority). They are characterized and distinguished with the help of only one special topological parameter.