Shear-resistant topology in quasi one-dimensional van der Waals material Bi$_4$Br$_4$
Jonathan K. Hofmann, Hoyeon Jeon, Saban M. Hus, Yuqi Zhang, Mingqian Zheng, Tobias Wichmann, An-Ping Li, Jin-Jian Zhou, Zhiwei Wang, Yugui Yao, Bert Voigtl\"ander, F. Stefan Tautz, Felix L\"upke

TL;DR
This study discovers a new shear-strain-induced in-plane shifted structure of Bi4Br4, revealing its topological insulator properties and expanding understanding of its electronic phases.
Contribution
The paper reports a new Bi4Br4 structure with a b/3 chain shift caused by shear strain, and confirms its higher-order topological insulator nature through experiments and DFT calculations.
Findings
Identified a new Bi4Br4 structure with b/3 chain shift
Observed bulk insulating gap and metallic edge states
Confirmed topological insulator properties via DFT
Abstract
BiBr is a prototypical quasi one-dimensional (1D) material in which covalently bonded bismuth bromide chains are arranged in parallel, side-by-side and layer-by-layer, with van der Waals (vdW) gaps in between. So far, two different structures have been reported for this compound, -BiBr and -BiBr , in both of which neighboring chains are shifted by , i.e., half a unit cell vector in the plane, but which differ in their vertical stacking. While the different layer arrangements are known to result in distinct electronic properties, the effect of possible in-plane shifts between the atomic chains remains an open question. Here, using scanning tunneling microscopy and spectroscopy (STM/STS), we report a new BiBr(001) structure, with a shift of between neighboring chains in the plane and AB layer stacking. We…
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