Fabrication of Hierarchical Sapphire Nanostructures using Ultrafast Laser Induced Morphology Change
Joshua Cheung, Kun-Chieh Chien, Peter Sokalski, Li Shi, Chih-Hao Chang

TL;DR
This study demonstrates a method to fabricate hierarchical sapphire nanostructures using ultrafast laser irradiation followed by selective etching, resulting in surfaces with enhanced hydrophobicity and broadband transmittance for optical applications.
Contribution
It introduces a novel laser-based fabrication process for sapphire nanostructures that enables large-area, selective etching guided by Raman spectroscopy insights.
Findings
Selective etching requires a threshold laser pulse intensity.
Fabricated structures exhibit a contact angle of 140 degrees, indicating high hydrophobicity.
Achieved broadband diffuse transmittance of up to 81.8%.
Abstract
Sapphire is an attractive material in photonic, optoelectronic, and transparent ceramic applications that stand to benefit from surface functionalization effects stemming from micro/nanostructures. Here we investigate the use of ultrafast lasers for fabricating nanostructures in sapphire by exploring the relationship between irradiation parameters, morphology change, and selective etching. In this approach an ultrafast laser pulse is focused on the sapphire substrate to change the crystalline morphology to amorphous or polycrystalline, which is characterized by examining different vibrational modes using Raman spectroscopy. The irradiated regions are then removed using a subsequent wet etch in hydrofluoric acid. Laser confocal measurements conducted before and after the etching process quantify the degree of selective etching. The results indicate that a threshold laser pulse intensity…
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Taxonomy
TopicsLaser Material Processing Techniques · Photonic Crystals and Applications · Nonlinear Optical Materials Studies
