Non-stoichiometry in SnS: How it affects thin-film morphology and electrical properties
Taichi Nogami, Issei Suzuki, Daiki Motai, Hiroshi Tanimura, Tetsu, Ichitsubo, Takahisa Omata

TL;DR
This study explores how non-stoichiometry influences the morphology and electrical properties of SnS thin films, demonstrating that precise compositional control enhances film quality and electrical performance for device applications.
Contribution
It introduces a sputtering method for accurate sulfur content control in SnS films and systematically analyzes how non-stoichiometry affects their morphology and electrical properties.
Findings
Non-stoichiometry on the S-rich side increases p-type carrier density.
S-poor non-stoichiometry causes minimal change due to defect self-compensation.
Stoichiometric films have smooth, dense morphologies.
Abstract
Tin sulfide (SnS) has garnered much attention as a promising material for various applications, including solar cells and thermoelectric devices, owing to its favorable optical and electronic properties and the abundant and nontoxic nature of its constituent elements. Herein, we investigated the effect of non-stoichiometry on the morphology and electrical properties of SnS thin films. Using a unique sputtering technique with a sulfur plasma supply, SnS films with precise sulfur content control, [S]/([Sn] + [S]) (xS) ranging from 0.47 to 0.51, were fabricated. Systematic characterization revealed that non-stoichiometry on the S-rich side led to a marked increase in the carrier density of p-type conduction, which was attributed to the formation of intrinsic acceptor-type defects. In contrast, non-stoichiometry on the S-poor side hardly affects the p-type electrical properties, apparently…
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Taxonomy
TopicsChalcogenide Semiconductor Thin Films · Semiconductor materials and interfaces · Copper-based nanomaterials and applications
