Influence of Photoemission Geometry on Timing and Efficiency in 4D Ultrafast Electron Microscopy
Simon A. Willis, David J. Flannigan

TL;DR
This study investigates how photoemission geometry affects timing and efficiency in 4D ultrafast electron microscopy, using simulations to optimize parameters for better instrument performance at low beam currents.
Contribution
It provides new insights into the influence of adjustable photoemission parameters on electron beam characteristics in 4D UEM, guiding improved instrument design and operation.
Findings
TOF is highly sensitive to Wehnelt aperture and cathode set-back
Collection efficiency shows non-intuitive responses to laser position
Recommendations for optimizing photoemission parameters for better performance
Abstract
Broader adoption of 4D ultrafast electron microscopy (UEM) for the study of chemical, materials, and quantum systems is being driven by development of new instruments as well as continuous improvement and characterization of existing technologies. Perhaps owing to the still-high barrier to entry, the full range of capabilities of laser-driven 4D UEM instruments has yet to be established, particularly when operated at extremely low beam currents (~fA). Accordingly, with an eye on beam stability, we have conducted particle tracing simulations of unconventional off-axis photoemission geometries in a UEM equipped with a thermionic-emission gun. Specifically, we have explored the impact of experimentally adjustable parameters on the time-of-flight (TOF), the collection efficiency (CE), and the temporal width of ultrashort photoelectron packets. The adjustable parameters include the Wehnelt…
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Taxonomy
TopicsElectron and X-Ray Spectroscopy Techniques · Advanced Electron Microscopy Techniques and Applications · Advancements in Photolithography Techniques
