Experimental Investigation of Variations in Polycrystalline Hf0.5Zr0.5O2 (HZO)-based MFIM
Tae Ryong Kim, Revanth Koduru, Zehao Lin, Peide. D. Ye, Sumeet, Kumar Gupta

TL;DR
This study experimentally investigates device-to-device variations in Hf0.5Zr0.5O2-based ferroelectric capacitors, revealing how variations depend on voltage and thickness, and validating findings with phase-field simulations.
Contribution
It provides the first experimental validation of simulation-predicted polarization variation mechanisms in HZO-based devices, linking variations to domain nucleation and polycrystallinity.
Findings
PR variation peaks near coercive voltage (VC)
PR variations are influenced by charge traps and domain switching
Scaling down TFE reduces variation non-monotonicity
Abstract
Device-to-device variations in ferroelectric (FE) hafnium oxide (HfO2)-based devices pose a crucial challenge that limits the otherwise promising capabilities of this technology. Although previous simulation-based studies have identified polarization (P) domain nucleation and polycrystallinity as key contributors to variations in HfO2, experimental validation remains limited. Here, we experimentally investigate variations in remanent polarization (PR) of Hf0.5Zr0.5O2 (HZO)-based metal-ferroelectric-insulator-metal (MFIM) capacitors across different set voltages (VSET) and FE thicknesses (TFE). Our measurements reveal a non-monotonic behavior of the standard deviation of PR with VSET peaking around coercive voltage (VC), which is consistent with previous simulation-based predictions. In the low- and high-VSET regions, PR variations are primarily dictated by saturation polarization (PS)…
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Taxonomy
TopicsSemiconductor materials and devices · Ferroelectric and Negative Capacitance Devices · Metal and Thin Film Mechanics
