Electron-irradiation effects on monolayer MoS2 at elevated temperatures
Carsten Speckmann, Kimmo Mustonen, Diana Propst, Clemens Mangler, Jani, Kotakoski

TL;DR
This study investigates how temperature influences defect creation and dynamics in monolayer MoS2 under electron irradiation, revealing temperature-dependent effects on defect visibility and migration energy barriers.
Contribution
It provides the first quantitative analysis of temperature effects on defect formation and migration in MoS2 during electron irradiation, combining experimental data with theoretical models.
Findings
Increased defect creation probability up to 150°C
Higher temperatures cause rapid defect diffusion, hiding damage
Estimated sulfur vacancy migration energy barrier as 0.26 eV
Abstract
The effect of electron irradiation on 2D materials is an important topic, both for the correct interpretation of electron microscopy experiments and for possible applications in electron lithography. After the importance of including inelastic scattering damage in theoretical models describing beam damage, and the lack of oxygen-sensitivity under electron irradiation in 2D MoS2 were recently shown, the role of temperature has remained unexplored on a quantitative level. Here we show the effect of temperature on both the creation of individual defects as well as the effect of temperature on defect dynamics. Based on the measured displacement cross section of sulphur atoms in MoS2 by atomic resolution scanning transmission electron microscopy, we find an increased probability for defect creation for temperatures up to 150{\deg}C, in accordance with theoretical predictions. However, higher…
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Taxonomy
Topics2D Materials and Applications · MXene and MAX Phase Materials · Chalcogenide Semiconductor Thin Films
