Dependence of Electrostatic Patch Force Evaluation on the Lateral Resolution of Kelvin Probe Force Microscopy
Kun Shi, Pengshun Luo, Jinquan Liu, Hang Yin, Zebing Zhou

TL;DR
This paper analyzes how the lateral resolution of Kelvin Probe Force Microscopy affects the accuracy of electrostatic patch force measurements, combining analytic formulas and numerical simulations to guide better evaluation practices.
Contribution
It introduces an analytic and numerical framework to assess the impact of KPFM resolution on patch force estimation accuracy, considering realistic conditions.
Findings
Patch force underestimation decreases with increased plate separation.
Lateral resolution significantly influences force estimation accuracy.
Analytic and numerical results show consistent dependence on patch size and potential fluctuation.
Abstract
Kelvin Probe Force Microscopy (KPFM) is widely used to measure the surface potential on samples, from which electrostatic patch force can be calculated. However, since the KPFM measurements represent a weighted average of local potentials on the sample, the accuracy of the evaluation critically depends on the precision and lateral resolution of the method. In this paper, we investigate the influence of this averaging effect on patch force estimations using both analytic and numerical methods. First, we derive the correlation functions of patch potential and establish the formulas for calculating the electrostatic patch forces in the parallel-plate geometry, with and without consideration of the KPFM measurement effect. Thus, an analytic method is established to determine the accuracy of patch force evaluation when the statistical parameters of the patch potential and the lateral…
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Taxonomy
TopicsForce Microscopy Techniques and Applications · Advanced Materials Characterization Techniques · Near-Field Optical Microscopy
