Ultrathin 3R-MoS$_2$ metasurfaces with atomically precise edges for efficient nonlinear nanophotonics
George Zograf, Bet\"ul K\"u\c{c}\"uk\"oz, Alexander Yu. Polyakov,, Maria Bancerek, Abhay V. Agrawal, Witlef Wieczorek, Tomasz J. Antosiewicz,, Timur O. Shegai

TL;DR
This paper reports the fabrication of ultrathin, atomically precise 3R-MoS$_2$ metasurfaces with zigzag edges that significantly enhance second-harmonic generation, advancing nonlinear nanophotonics with high-quality, defect-minimized structures.
Contribution
It introduces a novel fabrication method combining lithography and anisotropic wet etching of 3R-MoS$_2$ to create high-quality metasurfaces with broken-in-plane symmetry for enhanced nonlinear effects.
Findings
Over three orders of magnitude enhancement in SHG at specific wavelengths.
Successful fabrication of atomically precise zigzag-edged nanoholes.
Demonstration of the q-BIC concept in ultrathin metasurfaces.
Abstract
Dielectric metasurfaces that combine high-index materials with optical nonlinearities are widely recognized for their potential in various quantum and classical nanophotonic applications. However, the fabrication of high-quality metasurfaces poses significant material-dependent challenges, as their designs are often susceptible to disorder, defects, and scattering losses, which are particularly prone to occur at the edges of nanostructured features. Additionally, the choice of the material platforms featuring second-order optical nonlinearities, , is limited to broken-inversion symmetry crystals such as GaAs, GaP, LiNbO, and various bulk van der Waals materials, including GaSe and NbOCl. Here, we use a combination of top-down lithography and anisotropic wet etching of a specially stacked van der Waals crystal -- 3R-MoS, which exhibits both a high refractive index…
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Taxonomy
TopicsPlasmonic and Surface Plasmon Research · Photonic and Optical Devices · Advanced Fiber Optic Sensors
