Kinetics, thermodynamics, and catalysis of the cation incorporation into GeO2, SnO2, and (SnxGe1-x)O2 during suboxide molecular beam epitaxy
Wenshan Chen, Kingsley Egbo, Joe Kler, Andreas Falkenstein, Jonas, L\"ahnemann, and Oliver Bierwagen

TL;DR
This study investigates the kinetics and thermodynamics of suboxide incorporation during molecular beam epitaxy of GeO2, SnO2, and their alloy, revealing insights into growth control and cation exchange effects for oxide semiconductor development.
Contribution
It provides the first comprehensive analysis of suboxide MBE growth mechanisms for GeO2, SnO2, and their alloy, highlighting the catalytic role of SnO in promoting GeO incorporation.
Findings
Suboxide MBE simplifies growth kinetics and improves control over growth rates.
SnO incorporation is kinetically favored in binary growth due to oxidation efficiency and vapor pressure.
In alloy growth, GeO incorporation is preferred, with SnO suppressed, indicating a catalytic cation exchange effect.
Abstract
Rutile GeO is a promising ultra-wide bandgap semiconductor for future power electronic devices whose alloy with the wide bandgap semiconductor rutile-SnO enables bandgap engineering and the formation of heterostructure devices. The (SnGe)O alloy system is in its infancy and molecular beam epitaxy (MBE) is a well-suited technique for its thin-film growth, yet presents challenges in controlling the alloy composition and growth rate. To understand and mitigate this challenge, the present study comprehensively investigates the kinetics and thermodynamics of suboxide incorporation into GeO, SnO, and (SnGe)O during suboxide MBE, the latest development in oxide MBE using suboxide sources. We find suboxide MBE to simplify the growth kinetics, offering better control over growth rates than conventional MBE but without supporting cation-driven oxide…
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Taxonomy
TopicsLuminescence Properties of Advanced Materials · Glass properties and applications · Catalytic Processes in Materials Science
