Contact-interference Hybrid lithography: Toward Scalable Fabrication of cross-scale periodic micro structure and demonstration on infrared micro polarizer array
Tianshi Lu, Fuyuan Deng,Yufeng Wei, Zhipeng Zeng, Xinghui Li

TL;DR
This paper introduces a scalable, efficient fabrication method for micro-polarizer arrays using hybrid lithography, significantly reducing patterning time and achieving high-quality, high-performance infrared polarization devices.
Contribution
It combines laser interference and contact lithography to rapidly produce high-quality micro-polarizer arrays with minimal errors, advancing scalable fabrication techniques.
Findings
Patterning time reduced by 3-4 orders of magnitude.
Micro-polarizer array achieves >50% transmittance.
Extinction ratio exceeds 15dB in 3-15μm range.
Abstract
Subwavelength grating micro-polarizer arrays, as a type of focal plane division simultaneous detection method, are significantly advancing the development and practical application of polarization imaging technology. Based on the cross-scale, dual-period characteristics of the grating array, this paper proposes a fabrication method that combines laser interference lithography with contact lithography. This method constructs a complete single-layer micro-polarizer array photoresist pattern through a four-step lithography process. Compared to traditional point-by-point fabrication methods like EBL and FIB, the patterning time is reduced by 3 to 4 orders of magnitude. Additionally, by introducing a refractive index matching liquid and an alignment method based on substrate contours, the effects of gaps and splicing errors are minimized, resulting in high-quality photoresist patterns with…
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Taxonomy
TopicsNanofabrication and Lithography Techniques · Electrowetting and Microfluidic Technologies · Optical Coatings and Gratings
