Towards Large Scale Atomic Manufacturing: Heterodyne Grating Interferometer with Zero Dead-Zone
Can Cui, Lvye Gao, Pengbo Zhao, Menghan Yang, Lifu Liu, Yu Ma,, Guangyao Huang, Shengtong Wang, Linbin Luo, Xinghui Li

TL;DR
This paper introduces a compact heterodyne grating interferometer with zero dead-zone design, enabling highly precise, multidimensional measurements crucial for next-generation lithography and atomic manufacturing.
Contribution
The paper presents a novel interferometer design with zero dead-zone configuration, dual-frequency source, and a robust error correction algorithm, advancing measurement accuracy and reliability for large-scale atomic manufacturing.
Findings
Achieved resolution of 0.25 nm (XY) and 0.3 nm (Z)
Reduced measurement errors below 5% with correction algorithm
Demonstrated high stability and linearity in prototype tests
Abstract
This paper presents a novel heterodyne grating interferometer designed to meet the precise measurement requirements of next-generation lithography systems and large-scale atomic-level manufacturing. Utilizing a dual-frequency light source, the interferometer enables simultaneous measurement of three degrees of freedom. Key advancements include a compact zero Dead-Zone optical path configuration, significantly enhancing measurement reliability by mitigating the impact of light source fluctuations and air refractive index variations. A comprehensive crosstalk error analysis was conducted, resulting in a robust correction algorithm that reduces errors to below 5%. Performance testing of the prototype, size of 90mm*90mm*40mm, demonstrated exceptional resolution (0.25 nm in the XY-axis and 0.3 nm in the Z-axis), superior linearity (6.9e-5, 8.1e-5 and 16.2e-5 for the X, Y, and Z axes,…
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Taxonomy
TopicsMagneto-Optical Properties and Applications · Force Microscopy Techniques and Applications · Diamond and Carbon-based Materials Research
