Formation of Micrometer-Sized Textured Hexagonal Silicon Crystals via Nanoindentation

TL;DR

This study demonstrates how nanoindentation followed by annealing can reliably produce micrometer-sized textured hexagonal silicon crystals, revealing new pathways for phase transformation and potential optoelectronic applications.

Contribution

The paper introduces a novel method using nanoindentation and annealing to synthesize high-quality textured hexagonal silicon crystals with controlled microstructure.

Findings

Successful transformation of silicon into textured hexagonal silicon

Nanometer-sized grains organized into micrometer-scale domains

Nanoindentation as an effective tool for phase control in silicon

Abstract

We present a comprehensive study on the formation of micrometer-sized, textured hexagonal diamond silicon (hd-Si) crystals via nanoindentation followed by annealing. Utilizing advanced characterization techniques such as polarized Raman spectroscopy, high-resolution transmission electron microscopy, and electron energy-loss spectroscopy, we demonstrate the successful transformation of silicon into high-quality hd-Si. The experimental results are further supported by first-principles calculations and molecular dynamics simulations. Notably, the hd-Si phase consists of nanometer-sized grains with slight misorientations, organized into large micrometer-scale textured domains. These findings underscore the potential of nanoindentation as a precise and versatile tool for inducing pressure-driven phase transformations, particularly for the stabilization of hexagonal silicon. The textured nature of hd-Si also presents a unique opportunity to tailor its optical properties, opening new avenues for its application in semiconductor and optoelectronic devices.