Engineering Interfacial Charge Transfer through Modulation Doping for 2D Electronics
Raagya Arora, Ariel R. Barr, Daniel T. Larson, Michele Pizzochero,, Efthimios Kaxiras

TL;DR
This paper explores modulation doping via workfunction engineering in 2D semiconductors, identifying promising material combinations to reduce contact resistance and improve p-type transistor performance for next-generation electronics.
Contribution
It introduces a first-principles approach to identify effective modulation doping materials for 2D semiconductors, expanding beyond traditional choices and providing a roadmap for high-performance p-type transistors.
Findings
High electron affinity materials enable effective p-type doping.
Significant reduction in contact resistance predicted.
New material combinations for 2D transistors identified.
Abstract
Two-dimensional (2D) semiconductors are likely to dominate next-generation electronics due to their advantages in compactness and low power consumption. However, challenges such as high contact resistance and inefficient doping hinder their applicability. Here, we investigate workfunction-mediated charge transfer (modulation doping) as a pathway for achieving high-performance p-type 2D transistors. Focusing on type-III band alignment, we explore the doping capabilities of 27 candidate materials, including transition metal oxides, oxyhalides, and {\alpha}-RuCl3, on channel materials such as transition metal dichalcogenides (TMDs) and group-III nitrides. Our extensive first-principles density functional theory (DFT) reveal p-type doping capabilities of high electron affinity materials, including {\alpha}-RuCl3, MoO3, and V2O5. We predict significant reductions in contact resistance and…
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Taxonomy
TopicsAdvanced Memory and Neural Computing · Semiconductor Quantum Structures and Devices · Advanced Semiconductor Detectors and Materials
