TCAD Parameters for 4H-SiC: A Review
J\"urgen Burin, Philipp Gaggl, Simon Waid, Andreas Gsponer, Thomas Bergauer

TL;DR
This review comprehensively analyzes the current state of 4H-SiC material parameters, highlighting inconsistencies, gaps, and the need for further research to improve modeling and device design.
Contribution
It provides a critical overview of existing models and parameters for 4H-SiC, identifying inconsistencies and gaps to guide future research and improve TCAD simulations.
Findings
Identified inconsistencies in parameter values across studies
Highlighted the impact of temperature variations on parameters
Revealed gaps in characterization data and model accuracy
Abstract
In this literature review we investigate the permittivity, density-of-state mass, band gap, impact ionization, charge carrier recombination, incomplete ionization and mobility in 4H silicon carbide. We provide a comprehensive overview over characterization methods, models and parameters to lower the entrance barrier for newcomers and allow a critical evaluation of common material property descriptions. We further highlight areas for future research by identifying gaps in the current knowledge base. For each investigated property we found a large amount of models and parameter sets based on measurements, calculations or fittings. With literal and/or graphical comparisons we reveal qualitative good agreement but also flawed data values, misinterpretations of research results and inconsistencies among multiple investigations, even those directly referencing each other. We identify…
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Taxonomy
TopicsSilicon Carbide Semiconductor Technologies · Induction Heating and Inverter Technology · Advanced DC-DC Converters
