Initial high electric field -- vacuum arc breakdown test results for additively manufactured pure copper electrodes
A. Ratkus, T. Torims, G. Pikurs, V. Bjelland, S. Calatroni, R., Peacock, C. Serafim, M. Vretenar, W. Wuensch

TL;DR
This study evaluates the vacuum arc breakdown performance of additively manufactured pure copper electrodes, demonstrating their ability to withstand high electric fields with low breakdown rates, relevant for accelerator applications.
Contribution
It provides initial reference data on the high electric field performance of AM-produced pure copper electrodes in vacuum conditions.
Findings
AM electrodes can sustain high electric fields with low breakdown rates
Initial performance data for AM copper electrodes in vacuum arc tests
AM electrodes show promise for accelerator component applications
Abstract
Additive Manufacturing (AM) is already well-established for various manufacturing applications, providing many benefits such as design freedom, novel and complex cooling designs for the parts and different performance improvements, as well as significantly reducing the production time. With the mentioned characteristics, AM is also being considered as a technology for manufacturing a Radio Frequency Quadrupole (RFQ) prototype. For this application, an important parameter is the voltage holding capability of the surfaces. Furthermore, the voltage holding capability of pure copper surfaces manufactured by AM is of interest for the accelerator community at large for prospective future developments. To characterize these properties, a series of high electric field tests were performed on pure copper electrodes produced by AM, using the CERN pulsed high-voltage DC system. The tests were…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
