Mitigating Exposure Bias in Score-Based Generation of Molecular Conformations
Sijia Wang, Chen Wang, Zhenhao Zhao, Jiqiang Zhang, Weiran Cai

TL;DR
This paper identifies and measures exposure bias in score-based generative models for molecular conformations, introduces a compensation method called Input Perturbation, and achieves state-of-the-art results on key datasets.
Contribution
It is the first to measure exposure bias in SGMs for molecular conformations and proposes a novel compensation algorithm that improves model accuracy and diversity.
Findings
Exposure bias is significant in SGMs for molecular conformations.
Input Perturbation effectively reduces exposure bias and enhances model performance.
State-of-the-art results are achieved on the GEOM-Drugs dataset.
Abstract
Molecular conformation generation poses a significant challenge in the field of computational chemistry. Recently, Diffusion Probabilistic Models (DPMs) and Score-Based Generative Models (SGMs) are effectively used due to their capacity for generating accurate conformations far beyond conventional physics-based approaches. However, the discrepancy between training and inference rises a critical problem known as the exposure bias. While this issue has been extensively investigated in DPMs, the existence of exposure bias in SGMs and its effective measurement remain unsolved, which hinders the use of compensation methods for SGMs, including ConfGF and Torsional Diffusion as the representatives. In this work, we first propose a method for measuring exposure bias in SGMs used for molecular conformation generation, which confirms the significant existence of exposure bias in these models and…
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Taxonomy
TopicsComputational Drug Discovery Methods
MethodsDiffusion
