Industrial 300$\,$mm wafer processed spin qubits in natural silicon/silicon-germanium
Thomas Koch, Clement Godfrin, Viktor Adam, Julian Ferrero, Daniel, Schroller, Noah Glaeser, Stefan Kubicek, Ruoyu Li, Roger Loo, Shana Massar,, George Simion, Danny Wan, Kristiaan De Greve, Wolfgang Wernsdorfer

TL;DR
This paper demonstrates the fabrication of silicon spin qubits on a 300mm industrial wafer process line using natural silicon, achieving high coherence, fast control, and reproducibility crucial for scalable quantum computing.
Contribution
It presents the first fully industrial 300mm wafer process fabrication of natural silicon spin qubits with high performance and reproducibility, advancing scalable quantum processor development.
Findings
Charge noise below 2 μeV/√Hz
Spin relaxation times over 1 second
Single qubit gate fidelities above 99%
Abstract
The realisation of an universal quantum computer will require the operation of thousands to millions of qubits. The possibility of using existing industrial semiconductor fabrication techniques and infrastructure for up-scaling and reproducibility makes silicon based spin qubits one of the most promising platforms to achieve this goal. The implementation of the up to now largest semiconductor based quantum processor was realized in a silicon/silicon-germanium heterostructure known for its low charge noise, long qubit coherence times and fast driving speeds, but the high structural complexity creates challenges for industrial implementations. Here we demonstrate quantum dots hosted in a natural Si/SiGe heterostructure fully fabricated by an industrial 300mm semiconductor wafer process line from heterostructure growth to Co micromagnet monolithic integration. We report charge noise…
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Taxonomy
TopicsQuantum-Dot Cellular Automata
