Unusually high-density 2D electron gases in N-polar AlGaN/GaN heterostructures with GaN/AlN superlattice back barriers grown on sapphire substrates
Maciej Matys, Atsushi Yamada, Toshihiro Ohki

TL;DR
This paper reports the creation of extremely high-density N-polar AlGaN/GaN 2D electron gases on sapphire, achieved through GaN/AlN superlattice back barriers, with potential applications in electronic devices.
Contribution
Introduction of GaN/AlN superlattice back barriers to significantly enhance 2D electron gas density in N-polar AlGaN/GaN heterostructures on sapphire substrates.
Findings
2D electron gas density reached over 10^14 cm^-2
High electron mobility of 169 cm^2/Vs at room temperature
Low sheet resistance of 264 Ω/sq
Abstract
We reported on the observation of extremely high-density (cm) 2D electron gas in N-polar AlGaN/GaN heterostructures grown on sapphire substrates. Due to introducing the GaN/AlN superlattice (SL) back barrier between the GaN buffer layer and AlGaN barrier layer, we observed a giant enhancement of the 2D electron gas density at the GaN/AlGaN interface from cm (without SL) to cm (with SL back barrier) that is only one order of magnitude below the intrinsic crystal limit of cm. We found that the changes of 2D electron gas density with SL correlated well with the changes of the wafer warp parameter which suggests that the strains are responsible for the 2D electron gas density enhancement (reduction of the piezoelectric polarization in the GaN channel). Nevertheless, this finding is probably insufficient…
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Taxonomy
TopicsGaN-based semiconductor devices and materials · Ga2O3 and related materials
