Mitigating tilt-induced artifacts in reflection ptychography via optimization of the tilt angles
Sander Senhorst, Yifeng Shao, Sven Weerdenburg, Roland Horsten,, Christina Porter, Wim Coene

TL;DR
This paper introduces an AD-based method to optimize tilt angles in reflection ptychography, reducing artifacts and improving image quality without extensive calibration, demonstrated with EUV datasets.
Contribution
It presents a novel AD-based joint optimization of tilt angles in reflection ptychography, eliminating calibration needs and enhancing reconstruction fidelity.
Findings
Achieved tilt angle precision of ±0.05° at 70° incidence
Reduced artifacts and improved image reconstruction quality
Validated approach with EUV datasets from HHG and laser sources
Abstract
Ptychography in a reflection geometry shows great promise for non-destructive imaging of 3-dimensional nanostructures at the surface of a thick substrate. A major challenge to obtain high quality reflection-ptychographic images under near-grazing conditions has been to calibrate the incidence angle used to straighten the measured curved diffraction patterns in a process referred to as 'tilted plane correction' (TPC). In this work, we leverage the flexibility of automatic differentiation (AD)-based modeling to realise an alternative approach, where the tilted propagation is included into the forward model. Use of AD allows us to jointly optimize the tilt angles with the typical probe and object, eliminating the need for accurate calibration or random search optimization. The approach was validated using datasets generated with an extreme ultraviolet (EUV) beamline based on either a…
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Taxonomy
TopicsAdvanced X-ray Imaging Techniques · Crystallography and Radiation Phenomena · Nuclear Physics and Applications
