Benchmarking the integration of hexagonal boron nitride crystals and thin films into graphene-based van der Waals heterostructures
Taoufiq Ouaj, Christophe Arnold, Jon Azpeitia, Sunaja Baltic, Julien, Barjon, Jose Cascales, Huanyao Cun, David Esteban, Mar Garcia-Hernandez,, Vincent Garnier, Subodh K. Gautam, Thomas Greber, Said Said Hassani, Adrian, Hemmi, Ignacio Jimen\'ez, Catherine Journet

TL;DR
This paper introduces a benchmarking protocol for evaluating boron nitride substrates in graphene heterostructures, linking optical and electronic properties to device performance, emphasizing the importance of Raman spectroscopy for interface quality assessment.
Contribution
It provides a comprehensive benchmarking method combining optical and electronic characterization of BN crystals and films, highlighting the role of Raman linewidth in predicting graphene mobility.
Findings
High graphene mobility (80,000 cm²/Vs) achieved with long exciton lifetime BN crystals.
Carrier mobility exceeds 10,000 cm²/Vs in PVD-grown BN films.
Raman 2D linewidth correlates with interface quality and charge mobility.
Abstract
We present a benchmarking protocol that combines the characterization of boron nitride (BN) crystals and films with the evaluation of the electronic properties of graphene on these substrates. Our study includes hBN crystals grown under different conditions and scalable BN films deposited by either chemical or physical vapor deposition (CVD or PVD). We explore the complete process from boron nitride growth, over its optical characterization by time-resolved cathodoluminescence (TRCL), to the optical and electronic characterization of graphene by Raman spectroscopy after encapsulation and Hall bar processing. Within our benchmarking protocol we achieve a homogeneous electronic performance within each Hall bar device through a fast and reproducible processing routine. We find that a free exciton lifetime of 1 ns measured on as-grown hBN crystals by TRCL is sufficient to achieve high…
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