Variation of Electron-electron interaction in pyrochlore structures
Jianyu Li, Ji Liu, Mingjun Han, Waqas Haider, Yusuke, Nomura, Ho-Kin Tang

TL;DR
This study uses ab initio calculations to analyze how electron-electron interactions vary in pyrochlore structures, revealing that Coulomb interaction U plays a more dominant role than bandwidth W in driving metal-insulator transitions, with pressure effects being complex.
Contribution
It demonstrates that Coulomb interaction U is more influential than bandwidth W in the correlation-driven metal-insulator transition in pyrochlore compounds, challenging conventional bandwidth control views.
Findings
U/W ratio increases with chemical pressure, enhancing correlation strength.
U is more influential than W in metal-insulator transitions.
Physical pressure effects vary among different pyrochlore compounds.
Abstract
We conduct a comprehensive \textit{ab initio} investigation of electron-electron interactions within the pyrochlore structures of RRuO, RIrO, CaRuO, and CdRuO, where R denotes a rare-earth element. Utilizing a multiorbital Hubbard model, we systematically explore the effects of various rare-earth elements and applied high pressure on the correlation strength in these compounds. Our calculations on the Coulomb interaction parameter and the bandwidth reveal that the chemical pressure for RRuO and RIrO leads to an unusual increase in ratio, hence, increase in correlation strength. Contrary to conventional understanding of bandwidth control, our study identifies that the Hubbard is more influential than the bandwidth behind the metal-insulator landscape of RRuO and RIrO,…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsNuclear materials and radiation effects
