Characterization of AlGaAs/GeSn heterojunction band alignment via X-ray photoelectron spectroscopy

TL;DR

This study characterizes the band alignment in AlGaAs/GeSn heterojunctions using X-ray photoelectron spectroscopy, revealing a Type-I alignment that enhances electron confinement for potential laser applications.

Contribution

It provides the first quantitative analysis of band offsets in grafted AlGaAs/GeSn heterostructures, crucial for developing room-temperature GeSn lasers.

Findings

Valence band offset of 0.19 eV

Conduction band offset of 1.186 eV

Type-I band alignment confirmed

Abstract

GeSn-based SWIR lasers featuring imaging, sensing, and communications has gained dynamic development recently. However, the existing SiGeSn/GeSn double heterostructure lacks adequate electron confinement and is insufficient for room temperature lasing. The recently demonstrated semiconductor grafting technique provides a viable approach towards AlGaAs/GeSn p-i-n heterojunctions with better electron confinement and high-quality interfaces, promising for room temperature electrically pumped GeSn laser devices. Therefore, understanding and quantitatively characterizing the band alignment in this grafted heterojunction is crucial. In this study, we explore the band alignment in the grafted monocrystalline Al0.3Ga0.7As /Ge0.853Sn0.147 p-i-n heterojunction. We determined the bandgap values of AlGaAs and GeSn to be 1.81 eV and 0.434 eV by photoluminescence measurements, respectively. We further conducted X-ray photoelectron spectroscopy measurements and extracted a valence band offset of 0.19 eV and a conduction band offset of 1.186 eV. A Type-I band alignment was confirmed which effectively confining electrons at the AlGaAs/GeSn interface. This study improves our understanding of the interfacial band structure in grafted AlGaAs/GeSn heterostructure, providing experimental evidence of the Type-I band alignment between AlGaAs and GeSn, and paving the way for their application in laser technologies.