Oxide MBE-ARPES at SSRL Beamline 5-2

TL;DR

This paper discusses synchrotron ARPES studies of oxide thin films grown by in-situ MBE at SSRL beamline 5-2, demonstrating advanced characterization techniques for oxide materials.

Contribution

It presents the integration of MBE growth with synchrotron ARPES at SSRL beamline 5-2 for in-situ analysis of oxide thin films.

Findings

Successful in-situ ARPES measurements of oxide thin films

Enhanced understanding of electronic structures of oxides

Validation of combined MBE and ARPES methodology

Abstract

In this article, we highlight our synchrotron ARPES studies of oxide thin films grown by in-situ connected MBE at beamline 5-2 of Stanford Synchrotron Radiation Lightsource (SSRL).