Fabrication and characterization of low-loss Al/Si/Al parallel plate capacitors for superconducting quantum information applications
Anthony McFadden, Aranya Goswami, Tongyu Zhao, Teun van, Schijndel, Trevyn F.Q. Larson, Sudhir Sahu, Stephen Gill, Florent, Lecocq, Raymond Simmonds, Chris Palmstr{\o}m

TL;DR
This paper demonstrates that aluminum-contacted crystalline silicon fin capacitors can achieve low-loss, high-performance in superconducting circuits, enabling more compact quantum computing components with minimal energy loss.
Contribution
It introduces a novel fabrication of high aspect ratio Si-fin capacitors integrated into superconducting circuits, showing superior microwave performance and qubit coherence.
Findings
High quality factor (>500k) in lumped element resonators
Qubit T1 times exceeding 25 microseconds
Low loss and compact design suitable for quantum applications
Abstract
Increasing the density of superconducting circuits requires compact components, however, superconductor-based capacitors typically perform worse as dimensions are reduced due to loss at surfaces and interfaces. Here, parallel plate capacitors composed of aluminum-contacted, crystalline silicon fins are shown to be a promising technology for use in superconducting circuits by evaluating the performance of lumped element resonators and transmon qubits. High aspect ratio Si-fin capacitors having widths below with an approximate total height of 3m are fabricated using anisotropic wet etching of Si(110) substrates followed by aluminum metallization. The single-crystal Si capacitors are incorporated in lumped element resonators and transmons by shunting them with lithographically patterned aluminum inductors and conventional Josephson junctions respectively.…
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Taxonomy
TopicsSemiconductor materials and devices · Quantum and electron transport phenomena · Surface and Thin Film Phenomena
