Simulating Monolithic Active Pixel Sensors: A Technology-Independent Approach Using Generic Doping Profiles
H{\aa}kan Wennl\"of (1), Dominik Dannheim (2), Manuel Del Rio Viera (1, and 3), Katharina Dort (2, 4), Doris Eckstein (1), Finn Feindt (1),, Ingrid-Maria Gregor (1), Lennart Huth (1), Stephan Lachnit (1, 5), Larissa, Mendes (1, 3), Daniil Rastorguev (1, 6), Sara Ruiz Daza (1, 3)

TL;DR
This paper introduces a technology-independent simulation workflow for CMOS sensors using generic doping profiles, combining electrostatic and Monte Carlo methods to optimize sensor design without proprietary doping data.
Contribution
It presents a comprehensive simulation approach that integrates TCAD and Allpix Squared frameworks, enabling accurate, high-statistics sensor behavior predictions without proprietary doping profiles.
Findings
Maximum deviation of 4% from test beam data
Effective optimization tool for sensor design
Viable for realistic sensor behavior simulation
Abstract
The optimisation of the sensitive region of CMOS sensors with complex non-uniform electric fields requires precise simulations, and this can be achieved by a combination of electrostatic field simulations and Monte Carlo methods. This paper presents the guiding principles of such simulations, using a CMOS pixel sensor with a small collection electrode and a high-resistivity epitaxial layer as an example. The full simulation workflow is described, along with possible pitfalls and how to avoid them. For commercial CMOS processes, detailed doping profiles are confidential, but the presented method provides an optimisation tool that is sufficiently accurate to investigate sensor behaviour and trade-offs of different sensor designs without knowledge of proprietary information. The workflow starts with detailed electric field finite element method simulations in TCAD, using generic doping…
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