Strain-Enabled Giant Second-Order Susceptibility in Monolayer WSe$_2$
Zhizi Guan, Yunkun Xu, Junwen Li, Zhiwei Peng, Dangyuan Lei, David J. Srolovitz

TL;DR
This paper demonstrates that applying biaxial strain to monolayer WSe2 significantly enhances its second-order nonlinear susceptibility by inducing exciton double resonance, leading to potential advances in nonlinear optoelectronic devices.
Contribution
The study introduces a strain engineering method to dramatically boost second-order susceptibility in monolayer WSe2 by tuning exciton resonances into double resonance conditions.
Findings
Achieved up to 2000-fold enhancement in susceptibility through strain-induced exciton resonance tuning.
Identified that small biaxial strain (~0.16%) can induce double resonance states in WSe2.
Confirmed strain engineering as an effective approach to enhance nonlinear optical properties in 2D materials.
Abstract
Monolayer WSe (ML WSe) exhibits a high second-harmonic generation (SHG) efficiency under single 1-photon (1-p) or 2-photon (2-p) resonant excitation conditions due to enhanced second-order susceptibility compared with off-resonance excitation states \cite{lin2021narrow,wang2015giant}. Here, we propose a novel strain engineering approach to dramatically boost the in-plane second-order nonlinear susceptibility ( ) of ML WSe by tuning the biaxial strain to shift two K-valley excitons (the A-exciton and a high-lying exciton (HX)) into double resonance. We first identify the A-exciton and HX from the 2D Mott-Wannier model for pristine ML WSe and calculate the under either 1-p or 2-p resonance excitations, and observe a 39-fold enhancement arising from the 2-p HX resonance state compared with the A-exciton case. By applying a small…
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