Measuring the Adhesion of Graphene Flake Networks via Button Shear Tests
Jorge Eduardo Adatti Est\'evez, Josef Sch\"atz, Jasper Ruhkopf, Annika, Weber, David Tumpold, Alexander Z\"opfl, Ulrich Krumbein, Max Christian Lemme

TL;DR
This study introduces a quantitative method called button shear testing to measure the adhesion strength of graphene flake networks on silicon dioxide, revealing factors that enhance adhesion and providing insights into their mechanical properties for microelectronics.
Contribution
The paper develops and demonstrates a novel quantitative technique, BST, for measuring graphene network adhesion, and analyzes how flake structure and defects influence adhesion strength.
Findings
Flat flakes and defect reduction improve adhesion.
Graphene networks exhibit stronger adhesion than transferred CVD graphene.
HMDS treatment enhances overall adhesion force.
Abstract
Graphene flake-based dispersions are attractive materials for various applications in microelectronics because of their ease of fabrication and the potential to deposit them on diverse substrates. The integration of these materials into conductive networks and microdevices requires thorough knowledge of their mechanical material properties, including adhesion. This paper presents quantitative adhesion measurements of graphene flake networks on silicon dioxide (SiO) via button shear testing (BST). In this method, shear forces are applied to prefabricated micrometric buttons until they delaminate, providing information about the shear strength of the underlying graphene. We applied BST to graphene flake networks with different flake structures and defect densities. Flat flakes, a flat network structure, and a high flake defect density improve adhesion. We further demonstrate that…
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