Crater-shaped Enrichment of $\mathrm{V}_\mathrm{Si}$ Color Centers in $4H$-SiC using Single-Pulse Near-Infrared Femtosecond Laser Processing
Mengzhi Yan, Junlei Zhao, Ying Song, Bing Dong, Yifei Duan, Jianshi, Wang, Qingqing Sun, and Zongwei Xu

TL;DR
This paper presents a 3D molecular dynamics model to simulate laser-induced formation of silicon vacancy color centers in 4H-SiC, explaining crater-shaped enrichment patterns and advancing understanding of laser processing mechanisms in semiconductors.
Contribution
The study introduces a novel 3D-MD modeling approach to analyze laser-material interactions and the formation of V_Si color centers in 4H-SiC, providing mechanistic insights.
Findings
Crater-shaped V_Si enrichment explained by laser interaction dynamics.
Simulation results align with experimental observations of color center distribution.
Energy absorption characteristics of 4H-SiC at 1030 nm are quantified.
Abstract
Currently, Si vacancy () color centers in SiC are of significant interest due to their potential applications in quantum sensing and quantum communication. Meanwhile, the qualities of laser-induced color centers are well guaranteed. Femtosecond laser processing suffices for increasing the yield of color centers in bulk materials and forms crater-shaped enriched regions on the surface. However, there is a notable absence of existing simulation methods to explain the mechanisms behind laser-assisted color center generation. In this work, we design a three-dimensional molecular dynamics (3D-MD) model using an integral hemi-ellipsoidal shell mathematical model to simulate the interaction of Gaussian laser beams with bulk materials. Furthermore, we calculate the transmittance, absorption coefficient, refractive index,…
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Taxonomy
TopicsThin-Film Transistor Technologies · Silicon Carbide Semiconductor Technologies · Advanced Surface Polishing Techniques
