Modeling of surface-state induced inter-electrode isolation of $n$-on-$p$ devices in mixed-field and $\gamma$-irradiation environments
N. Akchurin, T. Peltola

TL;DR
This study models how surface-state induced traps affect inter-electrode isolation in n-on-p sensors under mixed-field and gamma irradiation, revealing that mixed-field radiation degrades isolation regardless of p-stop implants, unlike gamma irradiation.
Contribution
It provides a TCAD simulation analysis of inter-electrode resistivity and trap densities, showing the impact of different irradiation environments on sensor isolation performance.
Findings
Mixed-field irradiation causes higher deep trap densities, reducing p-stop effectiveness.
Gamma irradiation results in low trap densities, maintaining p-stop influence.
Sensors without p-stop implants may be suitable for hadron-rich radiation environments.
Abstract
In the HEP-experiments of High Luminosity upgrade of the Large Hadron Collider (HL-LHC), the application of isolation implants like -stop between -electrodes of position sensitive -on- sensors has been typically considered to counter the detrimental effect on position resolution of the accumulation of positive net oxide charge with radiation. In addition to the positively charged layer close to the Si/SiO-interface, surface damage introduced by radiation in SiO-passivated silicon particle detectors includes the accumulation of trapped-oxide-charge and interface traps. A previous study of either n/ (mixed field)- or -irradiated Metal-Oxide-Semiconductor (MOS) capacitors showed evidence of substantially higher introduction rates of acceptor- and donor-type deep interface traps () in mixed-field environment. In this work, an…
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Taxonomy
TopicsSemiconductor materials and devices · Advanced Memory and Neural Computing · Advancements in Semiconductor Devices and Circuit Design
