Double Etch Method for the Fabrication of Nanophotonic Devices from Van der Waals Materials

TL;DR

This paper introduces a double etch fabrication method for van der Waals materials, specifically hexagonal boron nitride, enabling high-quality photonic devices with improved large-area fabrication and masking techniques for quantum and optoelectronic applications.

Contribution

The paper presents a novel double etch process that overcomes masking limitations in vdW material fabrication, facilitating high-quality photonic structures like waveguides and resonators.

Findings

Successful fabrication of waveguides, resonators, and cavities

Demonstrated optical functionality in near-infrared and blue ranges

Achieved high-quality factor optical cavities

Abstract

The integration of van der Waals (vdW) materials into photonic devices has laid out a foundation for many new quantum and optoelectronic applications. Despite tremendous progress in the nanofabrication of photonic building blocks from vdW crystals, there are still limitations, specifically with large-area devices and masking. Here, we focus on hexagonal boron nitride (hBN) as a vdW material and present a double etch method that overcomes problems associated with methods that employ metallic films and resist-based films for masking. Efficacy of the developed protocol is demonstrated by designing and fabricating a set of functional photonic components including waveguides, ring resonators and photonic crystal cavities. The functionality of the fabricated structures is demonstrated through optical characterization over several key spectral ranges. These include the near-infrared and blue ranges, where the hBN boron vacancy (VB-) spin defects and the coherent B center quantum emitters emit, respectively. The double etch method enables fabrication of high-quality factor optical cavities and constitutes a promising pathway toward on-chip integration of vdW materials.