Selective area epitaxy of in-plane HgTe nanostrcutures on CdTe(001) substrate
Nicolas Chaize, Xavier Baudry, Pierre-Henri Jouneau, Eric Gautier,, Jean-Luc Rouvi\`ere, Yves Deblock, Jimmy Xu, Maxime Berthe, Cl\'ement Barbot,, Bruno Grandidier, Ludovic Desplanque, Hermann Sellier, Philippe Ballet

TL;DR
This paper demonstrates a selective area molecular beam epitaxy method to grow in-plane HgTe nanostructures on CdTe substrates, enabling complex nanostructure fabrication for future electronic and quantum applications.
Contribution
It introduces a novel selective area growth technique for in-plane HgTe nanostructures with controlled shape and high selectivity on CdTe substrates.
Findings
Successful growth of micron-long in-plane HgTe nanowires.
Formation of complex nanostructures like networks and rings.
Good electrical homogeneity and thermally activated transport observed.
Abstract
Semiconductor nanowires are believed to play a crucial role for future applications in electronics, spintronics and quantum technologies. A potential candidate is HgTe but its sensitivity to nanofabrication processes restrain its development. A way to circumvent this obstacle is the selective area growth technique. Here, in-plane HgTe nanostructures are grown thanks to selective area molecular beam epitaxy on a semi-insulating CdTe substrate covered with a patterned SiO mask. The shape of these nanostructures is defined by the in-plane orientation of the mask aperture along the <>, <>, or <> direction, the deposited thickness, and the growth temperature. Several micron long in-plane nanowires can be achieved as well as more complex nanostructures such as networks, diamond structures or rings. A good selectivity is achieved with very little…
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Taxonomy
TopicsAdvanced Semiconductor Detectors and Materials · Quantum Dots Synthesis And Properties · Chalcogenide Semiconductor Thin Films
