Fabrication of n+ contact on p-type high pure Ge by cathodic electrodeposition of Li and impedance analysis of n+/p diode at low temperatures
Manoranjan Ghosh, Pravahan Salunke, Shreyas Pitale, S. G. Singh, G. D., Patra, and Shashwati Sen

TL;DR
This study demonstrates the fabrication of a stable n+ contact on p-type germanium using cathodic electrodeposition of lithium, and analyzes the diode's impedance behavior at low temperatures relevant for radiation detection.
Contribution
It introduces a novel lithium electrodeposition method to create n+ contacts on germanium and provides detailed impedance analysis of the resulting diode at various temperatures.
Findings
Li diffuses up to 500 microns in Ge after heat treatment.
The n+/p diode shows ideal characteristics with temperature-dependent impedance.
The diode's capacitance and impedance behavior vary with bias and frequency.
Abstract
Fabrication of diode by forming n-type electrical contact on germanium (Ge) and its AC impedance analysis is important for radiation detection in the form of pulses. In this work lithium (Li) metal has been electro-deposited on p-type Ge single crystal from molten lithium nitrate at 260{\deg}C. The depth of Li diffusion in Ge was successfully varied by changing the electroplating time as determined by sheet resistance (SR) measurement after successive lapping of Ge surface. Li is found to diffuse up to 500 micron inside Ge by heat treatment of as deposited Li/Ge at 350{\deg}C for 1 hour. A stable n-type electrical contact on Ge with SR ~1 ohm/square and impurity concentration ~3.7x10^15/cm^3 is developed by Li incorporation in p-type Ge crystal showing net carrier concentration ~3.4x10^10/cm^3 and SR ~100 Kohm/square. Acceptor concentration determined from the 1/C^2 vs V plot shows…
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Taxonomy
TopicsSemiconductor materials and interfaces · Semiconductor materials and devices · Silicon and Solar Cell Technologies
