Improvement of the perovskite photodiodes performance via advanced interface engineering with polymer dielectric
A.P. Morozov, L.O. Luchnikov, S. Yu. Yurchuk, A.R. Ishteev, P.A., Gostishchev, S.I. Didenko, N.S. Saratovsky, S.S. Kozlov, D.S. Muratov, Yu. N., Luponosov, D.S. Saranin

TL;DR
This study enhances perovskite photodiode performance by interface engineering with P(VDF-TrFE), leading to improved detectivity, dynamic range, and response times without altering the film morphology.
Contribution
It introduces a novel interface modification using P(VDF-TrFE) that significantly improves charge transport and device performance in perovskite photodiodes.
Findings
Increased specific detectivity from 10^11 to 10^12 Jones
Expanded linear dynamic range up to 100 dB
Reduced rise/fall times and increased cut-off frequency
Abstract
Halide perovskite-based photodiodes are promising for efficient detection across a broad spectral range. Perovskite absorber thin-films have a microcrystalline morphology, characterized by a high density of surface states and defects at inter-grain interfaces. In this work, we used dielectric-ferroelectric poly(vinylidene-fluoride-trifluoroethylene-P(VDF-TrFE) to modify the bulk interfaces and electron transport junction in p-i-n perovskite photodiodes. Our complex work demonstrates that interface engineering with P(VDF-TrFE) induces significant Fermi level pinning, reducing from 4.85 eV for intrinsic perovskite to 4.28 eV for the configuration with dielectric interlayers. The integration of P(VDF-TrFE) into the perovskite film did not affect the morphology and crystal structure, but significantly changed the charge transport and device performance. IV curve analysis and 2-diode model…
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Taxonomy
TopicsPerovskite Materials and Applications
