Development of Volume Produced Negative Ion Source using a CCRF Discharge

TL;DR

This paper reports the development of a volume-produced negative ion source using a CCRF discharge with a push-pull configuration, demonstrating controllable plasma conditions and enhanced negative ion production through magnetic field application.

Contribution

It introduces a novel negative ion source design utilizing a CCRF push-pull configuration and magnetic field control for improved plasma and negative ion production.

Findings

Plasma potential maintained between 20-40 V.

Magnetic field enhances negative ion production.

Push-pull configuration offers better plasma control.

Abstract

This work shows the development of a volume-produced negative ion source that consists of annular parallel plates driven by a 13.56 MHz capacitively coupled radio frequency in a push-pull configuration. This source shows advantages in controlling plasma conditions by varying the pressure, power, and applied axial magnetic field. It is found that the push-pull configuration allows the plasma potential to remain in the range of 20 to 40 Volts. Conversely, the application of a magnetic field helps serves to augment the production of negative ions in the central hollow part of the annular plate. Further, a plausible explanation to the obtained experimental results is presented.