Selective Undercut of Undoped Optical Membranes for Spin-Active Color Centers in 4H-SiC
Jonathan R. Dietz, Aaron M. Day, Amberly Xie, Evelyn L. Hu

TL;DR
This paper introduces a novel selective photoelectrochemical etching method based on electrical depletion, enabling the fabrication of high-purity undoped SiC membranes that enhance quantum emitter performance.
Contribution
Developed a doping-independent etching process using diode depletion to create undoped SiC membranes for quantum and photonic applications.
Findings
Undoped membranes show >3x longer spin lifetime than doped ones.
The process allows scalable fabrication of high-purity SiC thin films.
Membranes are compatible with quantum emitters for quantum technologies.
Abstract
Silicon carbide (SiC) is a semiconductor used in quantum information processing, microelectromechanical systems, photonics, power electronics, and harsh environment sensors. However, its high temperature stability, high breakdown voltage, wide bandgap, and high mechanical strength are accompanied by a chemical inertness which makes complex micromachining difficult. Photoelectrochemical etching is a simple, rapid means of wet processing SiC, including the use of dopant selective etch stops that take advantage of mature SiC homoepitaxy. However, dopant selective photoelectrochemical etching typically relies on highly doped material, which poses challenges for device applications such as quantum defects and photonics that benefit from low doping to produce robust emitter properties and high optical transparency. In this work, we develop a new, selective photoelectrochemical etching process…
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Taxonomy
TopicsMagnetic properties of thin films · Photonic Crystals and Applications
