A novel measurement method for SiPM external crosstalk probability at low temperature
Guanda Li, Lei Wang, Xilei Sun, Fang Liu, Cong Guo, Kangkang Zhao, Lei, Tian, Zeyuan Yu, Zhilong Hou, Chi Li, Yu Lei, Bin Wang, Rongbin Zhou

TL;DR
This paper introduces a new method to measure external crosstalk probability in SiPMs at low temperatures using a simple two-SiPM setup, revealing a linear relationship with overvoltage and enabling PDE measurement.
Contribution
A novel measurement technique for external crosstalk probability in SiPMs at low temperature that does not require complex optical setups.
Findings
External crosstalk probability increases linearly with overvoltage.
The method enables simultaneous measurement of photon detection efficiency at low temperature.
The setup is simple, enclosed, and effective for low-temperature SiPM characterization.
Abstract
Silicon photomultipliers (SiPMs) are being considered as potential replacements for conventional photomultiplier tubes (PMTs). However, a significant disadvantage of SiPMs is crosstalk (CT), wherein photons propagate through other pixels, resulting in secondary avalanches. CT can be categorized into internal crosstalk and external crosstalk based on whether the secondary avalanche occurs within the same SiPM or a different one. Numerous methods exist for quantitatively estimating the percentage of internal crosstalk (iCT). However, external crosstalk (eCT) has not been extensively studied. This article presents a novel measurement method for the probability of emitting an external crosstalk photon during a single pixel avalanche, using a setup involving two identical SiPMs facing each other, and without the need for complex optical designs. The entire apparatus is enclosed within a…
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Taxonomy
TopicsSemiconductor materials and interfaces · Integrated Circuits and Semiconductor Failure Analysis · Semiconductor materials and devices
