Cryogenic growth of tantalum thin films for low-loss superconducting circuits
Teun A. J. van Schijndel, Anthony P. McFadden, Aaron N. Engel, Jason, T. Dong, Wilson J. Y\'anez-Parre\~no, Manisha Parthasarathy, Raymond W., Simmonds, Christopher J. Palmstr{\o}m

TL;DR
This study demonstrates that cryogenic growth of tantalum thin films via low-temperature MBE stabilizes single-phase alpha-Ta with low resistivity and smooth surface morphology, suitable for superconducting circuits and qubits.
Contribution
It introduces a cryogenic MBE process for growing high-quality alpha-Ta films on various substrates, enhancing their suitability for superconducting applications.
Findings
Cryogenic growth stabilizes single-phase alpha-Ta on multiple substrates.
Films grown at 7 K exhibit low resistivity and high RRR.
Coplanar waveguide resonators show high quality factors, indicating low loss.
Abstract
Motivated by recent advancements highlighting Ta as a promising material in low-loss superconducting circuits and showing long coherence times in superconducting qubits, we have explored the effect of cryogenic temperatures on the growth of Ta and its integration in superconducting circuits. Cryogenic growth of Ta using a low temperature molecular beam epitaxy (MBE) system is found to stabilize single phase -Ta on several different substrates, which include AlO(0001), Si(001), Si(111), SiN, and GaAs(001). The substrates are actively cooled down to cryogenic temperatures and remain < 20 K during the Ta deposition. X-ray -2 diffraction after warming to room temperature indicates the formation of polycrystalline -Ta. The 50 nm -Ta films grown on AlO(0001) at a substrate manipulator temperature…
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Taxonomy
TopicsPhysics of Superconductivity and Magnetism · Superconducting Materials and Applications · Superconductivity in MgB2 and Alloys
