Disorder-resilient transport through dopant arrays in silicon
Micha{\l} Gawe{\l}czyk, Garnett W. Bryant, Micha{\l} Zieli\'nski

TL;DR
This paper demonstrates that transport in disordered dopant arrays in silicon remains robust due to strong correlations, with current following shortest paths, simplifying device characterization despite disorder.
Contribution
The study introduces a theoretical approach combining Hubbard model diagonalization and Green's functions to analyze transport in disordered dopant arrays, revealing resilience to disorder.
Findings
Transport features are highly resilient to disorder.
Current follows shortest paths avoiding obstacles.
Array behavior resembles parallel chains with Coulomb coupling.
Abstract
Chains and arrays of phosphorus donors in silicon have recently been used to demonstrate dopant-based quantum simulators. The dopant disorder present in fabricated devices must be accounted for. Here, we theoretically study transport through disordered donor-based arrays that model recent experimental results. We employ a theory that combines the exact diagonalization of an extended Hubbard model of the array with a non-equilibrium Green's function formalism to model transport in interacting systems. We show that current flow through the array and features of measured stability diagrams are highly resilient to disorder. We interpret this as an emergence of uncomplicated behavior in the multi-electron system dominated by strong correlations, regardless of array filling, where the current follows the shortest paths between source and drain sites that avoid possible obstacles.…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
Taxonomy
TopicsSilicon and Solar Cell Technologies · Advancements in Semiconductor Devices and Circuit Design · Semiconductor materials and interfaces
