Log-normal glide and the formation of misfit dislocation networks in heteroepitaxial ZnS on GaP
Alexandra Fonseca Montenegro, Marzieh Baan, Maryam Ghazisaeidi, Tyler J. Grassman, Roberto C. Myers

TL;DR
This study uses electron microscopy to analyze misfit dislocation networks in ZnS grown on GaP, revealing how dislocation formation and glide influence strain relaxation and surface morphology during heteroepitaxy.
Contribution
It provides detailed insights into the formation, distribution, and dynamics of misfit dislocations in ZnS/GaP heteroepitaxy, including the log-normal distribution of MD lengths and anisotropic dislocation glide velocities.
Findings
MDs are absent below 15-20 nm thickness.
MD lengths follow a log-normal distribution.
Dislocation glide velocity varies with direction and film thickness.
Abstract
Scanning electron microscopy (SEM) based electron channeling contrast imaging (ECCI) is used to observe and quantify misfit dislocation (MD) networks formed at the heteroepitaxial interface between ZnS and GaP grown by molecular beam epitaxy (MBE). Below a critical thickness of 15-20 nm, no MDs are observed. However, crystallographic features with strong dipole contrast, consistent with unexpanded dislocation half-loops, are observed prior to the formation of visible interfacial MD segments and any notable strain relaxation. At higher film thicknesses (20 to 50 nm), interfacial MD lengths increase anisotropically in the two orthogonal in-plane <110> line directions, threading dislocation (TD) density increases, and a roughening transition is observed from atomically smooth two-dimensional (2D) to a multi-stepped three-dimensional (3D) morphology, providing evidence for step edge pinning…
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Taxonomy
TopicsSemiconductor Quantum Structures and Devices · Semiconductor materials and interfaces · Advanced Semiconductor Detectors and Materials
