Chemically Stable Group IV-V Transition Metal Carbide Thin Films in Hydrogen Radical Environments
Abdul Rehman, Robbert W.E. van de Kruijs, Wesley T.E. van den Beld,, Jacobus M. Sturm, and Marcelo Ackermann

TL;DR
This study investigates the stability of group IV-V transition metal carbide thin films as protective coatings in hydrogen radical environments, revealing their potential to resist reduction and diffusion at high temperatures.
Contribution
It introduces the use of specific TMC thin films as hydrogen-protective coatings and analyzes their surface chemistry and reduction mechanisms in reactive hydrogen environments.
Findings
HfC, ZrC, TiC, TaC, NbC, and VC are stable with reduced surface oxides.
Co2C shows strong carbide reduction and oxide reduction.
Hydrogenation limits TMC reduction, while oxide reduction depends on H2O formation barriers.
Abstract
Hydrogen is playing a crucial role in the green energy transition. Yet, its tendency to react with and diffuse into surrounding materials poses a challenge. Therefore, it is critical to develop coatings that protect hydrogen-sensitive system components in reactive-hydrogen environments. In this work, we report group IV-V transition metal carbide (TMC) thin films as potential candidates for hydrogen-protective coatings in hydrogen radical (H*) environments at elevated temperatures. We identify three classes of TMCs based on the reduction of carbides and surface oxides (TMOx). HfC, ZrC, TiC, TaC, NbC, and VC (class A) are found to have a stable carbidic-C (TM-C) content, with a further sub-division into partial (class A1: HfC, ZrC, and TiC) and strong (class A2: TaC, NbC, and VC) surface TMOx reduction. In contrast to class A, a strong carbide reduction is observed in Co2C (class B),…
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Taxonomy
TopicsSemiconductor materials and devices · ZnO doping and properties · Copper Interconnects and Reliability
