Twenty-nine million Intrinsic Q-factor Monolithic Microresonators on Thin Film Lithium Niobate
Xinrui Zhu, Yaowen Hu, Shengyuan Lu, Hana K. Warner, Xudong Li,, Yunxiang Song, Leticia Magalhaes, Amirhassan Shams-Ansari, Neil Sinclair,, Marko Loncar

TL;DR
This paper reports the fabrication of TFLN microresonators with a record-high intrinsic Q factor of 29 million, significantly reducing propagation loss and advancing integrated photonics capabilities.
Contribution
It demonstrates the highest intrinsic Q factor achieved in TFLN microresonators, approaching the material limit through improved fabrication techniques.
Findings
Intrinsic Q factor of 29 million achieved
Propagation loss reduced to 1.3 dB/m
Statistical analysis of Q factors across geometries
Abstract
The recent emergence of thin-film lithium niobate (TFLN) has extended the landscape of integrated photonics. This has been enabled by the commercialization of TFLN wafers and advanced nanofabrication of TFLN such as high-quality dry etching. However, fabrication imperfections still limit the propagation loss to a few dB/m, restricting the impact of this platform. Here, we demonstrate TFLN microresonators with a record-high intrinsic quality (Q) factor of twenty-nine million, corresponding to an ultra-low propagation loss of 1.3 dB/m. We present spectral analysis and the statistical distribution of Q factors across different resonator geometries. Our work pushes the fabrication limits of TFLN photonics to achieve a Q factor within one order of magnitude of the material limit.
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Taxonomy
TopicsPhotonic and Optical Devices · Acoustic Wave Resonator Technologies · Photorefractive and Nonlinear Optics
