Photolithography Control System : A Case Study For Cyber-Physical System

TL;DR

This paper discusses how adopting a cyber-physical system framework can improve the design and management of complex photolithography control systems by integrating computation and physical processes.

Contribution

It demonstrates that a CPS-based approach offers a holistic, model-driven, and integrated design methodology for PCS, highlighting its advantages over traditional embedded systems.

Findings

CPS approach enhances system robustness and flexibility.

Model-based design improves control accuracy.

Holistic perspective facilitates system integration.

Abstract

Photolithography control system (PCS) is an extremely complex distributed control system, which is composed of dozens of networked microprocessors, hundreds of actuators, hundreds of thousands of sensors, and millions of lines of code. Cyber-physical system (CPS), which deeply merges computation with physical processes together, copes with complex system from a higher level of abstraction. PCS is a representative CPS. This work points out that thinking under the framework of CPS, which includes holistic perspective, model-based design, hardware/software co-design and continuous integration, could solve the issues presented in the current PCS. Although the traditional embedded system approach and the CPS approach would be coexisting in the PCS for a long time, the CPS approach is definitely the future of the PCS development.