Investigation of photosensitive and photodetector characteristics of n-TPA-IFA/p-Si heterojunction structure
Sukru Cavdar, Pinar Oruc, Serkan Eymur, Nihat Tugluoglu

TL;DR
This study synthesized and characterized an n-TPA-IFA/p-Si heterojunction diode, demonstrating its potential as a photodetector with tunable photoresponse properties under different light intensities.
Contribution
It is the first to investigate the photosensitive and photodetector characteristics of n-TPA-IFA/p-Si heterojunctions, combining organic synthesis, theoretical calculations, and electrical measurements.
Findings
High rectification ratio (~10^4) indicating diode quality
Photoresponsivity and photosensitivity increase with light intensity
LDR improves with higher light intensities, suitable for image sensors
Abstract
n-TPA-IFA organic material was synthesized and deposited on p-Si by spin coating method to produce n-TPA-IFA/p-Si heterojunction diode. We determined that the dielectric constant and energy band gap of TPA-IFA organic material were 3.91 and 3.37 eV by DFT/B3LYP/6-311G(d,p) method using on Gaussian 09 W, respectively and the carrier type of TPA-IFA organic semiconductor material was also n-type at room temperature from temperature-dependent hall effect measurements. Using forward and reverse bias I-V measurements in the dark and under various light intensities, we examined the key electrical characteristics of the n-TPA-IFA/p-Si heterojunction diodeincluding, Qb and n. It was determined that the rectification ratio (RR) was approximately 104. The reverse current's observed increasing behavior with increasing light indicates that the produced heterojunction diode can be utilized as a…
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Taxonomy
TopicsSemiconductor materials and interfaces · Ga2O3 and related materials · Advanced ceramic materials synthesis
