Atomic Defect-Aware Physical Design of Silicon Dangling Bond Logic on the H-Si(100)2x1 Surface
Marcel Walter, Jeremiah Croshaw, Samuel Sze Hang Ng, Konrad Walus,, Robert Wolkow, Robert Wille

TL;DR
This paper develops a defect-aware design automation framework for silicon dangling bond logic on H-Si(100) surfaces, addressing atomic-scale defects to improve robustness and guide fabrication standards.
Contribution
It introduces a surface defect model and an automatic placement and routing algorithm that incorporate experimental defect data for more resilient circuit designs.
Findings
Robust designs can tolerate defect rates up to 0.1%.
Defect sensitivities identified in the gate library.
Quantitative assessment of defect impact on circuit reliability.
Abstract
Although fabrication capabilities of Silicon Dangling Bonds have rapidly advanced from manual labor-driven laboratory work to automated manufacturing in just recent years, sub-nanometer substrate defects still pose a hindrance to production due to the need for atomic precision. In essence, unpassivated or missing surface atoms, contaminants, and structural deformations disturb the fabricated logic or prevent its realization altogether. Moreover, design automation techniques in this domain have not yet adopted any defect-aware behavior to circumvent the present obstacles. In this paper, we derive a surface defect model for design automation from experimentally verified defect types that we apply to identify sensitivities in an established gate library in an effort to generate more robust designs. Furthermore, we present an automatic placement and routing algorithm that considers scanning…
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Taxonomy
TopicsSemiconductor materials and devices · Advanced Surface Polishing Techniques · Integrated Circuits and Semiconductor Failure Analysis
