Non-equilibrium Thermal Resistance of Interfaces Between III-V Compounds
Jinchen Han, Sangyeop Lee

TL;DR
This study reveals that phonon non-equilibrium significantly increases interfacial thermal resistance in III-V semiconductor interfaces, with the effect strongly depending on vibrational spectra mismatch and phonon relaxation dynamics.
Contribution
It systematically quantifies how phonon non-equilibrium affects thermal resistance at semiconductor interfaces, contrasting with traditional equilibrium-based models.
Findings
Non-equilibrium phonons increase interfacial resistance by 2-3 times.
Thermal resistance correlates with Debye temperature mismatch.
Phonon relaxation length varies from 50nm to 1.5μm depending on material pairing.
Abstract
Interfacial thermal resistance has been often estimated and understood using the Landauer formalism that assumes incident phonons with equilibrium distribution. However, previous studies suggest that phonons are out-of-equilibrium near the interface because of the heat flow through the leads and the scattering of phonons by the interface. In this paper, we report a systematic study on how vibrational spectra mismatch affects the degree of phonon non-equilibrium near an interface, how fast it is relaxed as the phonons diffuse into a lead, and the overall interfacial thermal resistance from the non-equilibrium phonons. Our discussion is based on the solution of the Peierls-Boltzmann transport equation with ab initio inputs for 36 interfaces between semi-infinite group-III (Al, Ga, In) and group-V (P, As, Sb) compound semiconductor leads. The simulation reveals that the non-equilibrium…
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Taxonomy
TopicsThermal properties of materials · Advanced Thermoelectric Materials and Devices · Semiconductor materials and interfaces
