Development of a Selective Wet-Chemical Etchant for 3D Structuring of Silicon via Nonlinear Laser Lithography

TL;DR

This paper presents a novel copper nitrate-based wet chemical etchant for precise 3D silicon structuring via nonlinear laser lithography, achieving high selectivity and smooth surfaces without damaging unmodified silicon.

Contribution

It introduces a new chromium-free etching recipe that offers high selectivity and surface quality for laser-processed silicon, supported by experimental and theoretical analysis.

Findings

Achieved etch selectivity over 1600 times for laser-modified silicon

Developed a copper nitrate-based etchant with high etch rate and smooth surfaces

Supported findings with density functional theory calculations

Abstract

Recently-demonstrated high-quality three-dimensional (3D) subsurface laser processing inside crystalline silicon (c-Si) wafers opens a door to a wide range of novel applications in multidisciplinary research areas. Using this technique, a novel maskless micro-pillars with precise control on the surface reflection and coverage are successfully fabricated by etching the laser processed region of c-Si wafer. To achieve this, a particular selective wet chemical etching is developed to follow subsurface laser processing of c-Si to reveal the desired 3D structures with smooth surfaces. Here, we report the development of a novel chromium-free chemical etching recipe based on copper nitrate, which yields substantially smooth surfaces at high etch rate and selectivity on the both laser-processed Si surface and subsurface, i.e., without significant etching of the unmodified Si. Our results show that the etch rate and surface morphology are interrelated and strongly influenced by the composition of the adopted etching solution. After an extensive compositional study performed at room temperature, we identify an etchant with a selectivity of over 1600 times for laser-modified Si with respect to unmodified Si. We also support our findings using density functional theory calculations of HF and Cu adsorption energies, indicating significant diversity on the c-Si and laser-modified surfaces.